Quaternary Barrier InAlGaN HEMTs With fT/fmax of 230/300 GHz

نویسندگان

  • Ronghua Wang
  • Guowang Li
  • Golnaz Karbasian
  • Jia Guo
  • Bo Song
  • Yuanzheng Yue
  • Zongyang Hu
  • Oleg Laboutin
  • Yu Cao
  • Wayne Johnson
  • Huili Grace Xing
چکیده

Depletion-mode quaternary barrier In0.13Al0.83 Ga0.04N high-electron-mobility transistors (HEMTs) with regrown ohmic contacts and T-gates on a SiC substrate have been fabricated. Devices with 40-nm-long footprints show a maximum output current density of 1.8 A/mm, an extrinsic dc transconductance of 770 mS/mm, and cutoff frequencies fT /fmax of 230/300 GHz at the same bias, which give a record-high value of √ fT · fmax = 263 GHz among all reported InAl(Ga)N barrier HEMTs. The device speed shows good scalability with gate length despite the onset of short-channel effects due to the lack of a back barrier. An effective electron velocity of 1.36 × 10 cm/s, which is comparable with that in the state-of-the-art deeply scaled AlN/GaN HEMTs, has been extracted from the gate-length dependence of fT for gate lengths from 100 to 40 nm.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

30 - nm InAs PHEMTs With fT = 644 GHz and f max = 681 GHz Dae

We present 30-nm InAs pseudomorphic HEMTs (PHEMTs) on an InP substrate with record fT characteristics and well-balanced fT and fmax values. This result was obtained by improving short-channel effects through widening of the siderecess spacing (Lside) to 150 nm, as well as reducing parasitic source and drain resistances. To compensate for an increase in Rs and Rd due to Lside widening, we optimi...

متن کامل

Structural characterization of wet-etched quaternary InAlGaN barrier HEMT structure

The quaternary nitride-based high electron mobility transistor (HEMT) has been recently a focus of interest because of the possibility to grow lattice-matched barrier to GaN and tune the barrier bandgap at the same time [1]. The reduction of strain-related defects, the high polarization at the interface and high carrier mobility of the 2-dimensional electron gas (2DEG) make InAlGaN a viable way...

متن کامل

Large Signal Properties of AlGaN/GaN HEMTs on High Resistivity Silicon Substrates Grown by MBE

The large signal characteristics of 1 m long -gate AlGaN/GaN HEMTs on resistive silicon substrates have been measured and analyzed. The HEMTs demonstrated maximum transconductance and current density values of 350 mS/mm and 1,200 mA/mm respectively. High current gain and maximum power gain frequencies ft and fmax were measured at 25 GHz and 43 GHz. Large signal gain and power density values of ...

متن کامل

High transconductance enhancement-mode AlGaN/GaN HEMTs on SiC substrate - Electronics Letters

Using inductively-coupled-plasma reactive ion etching (ICP-RIE), recessed 1 mm gate-length enhancement-mode (E-mode) AlGaN=GaN high electron mobility transistors (HEMTs) were fabricated. These 1 mm gate-length devices exhibited maximum drain current density of 470 mA=mm, extrinsic transconductance of 248 mS=mm and threshold voltage of 75 mV. These characteristics are much higher than previously...

متن کامل

Sb-Based n- and p-Channel Heterostructure FETs for High-Speed, Low-Power Applications

Heterostructure field-effect transistors (HFETs) composed of antimonide-based compound semiconductor (ABCS) materials have intrinsic performance advantages due to the attractive electron and hole transport properties, narrow bandgaps, low ohmic contact resistances, and unique band-lineup design flexibility within this material system. These advantages can be particularly exploited in applicatio...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2013